A comparison of strong and weak distributed transverse coupling between VLSI interconnects

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dc.contributor.authorÖzkaramanli, H
dc.date.accessioned2026-02-06T18:49:37Z
dc.date.issued2001
dc.departmentDoğu Akdeniz Üniversitesi
dc.description.abstractCrosstalk under strong and weak coupling is compared and the two cases are shown to be identical for the important low-frequency range, where the significant components of the input excitation He. The validity of weak coupling is established in terms of rise time and physical length of interconnects.
dc.identifier.doi10.1109/43.969441
dc.identifier.endpage1478
dc.identifier.issn0278-0070
dc.identifier.issue12
dc.identifier.scopus2-s2.0-0035674833
dc.identifier.scopusqualityQ1
dc.identifier.startpage1472
dc.identifier.urihttps://doi.org/10.1109/43.969441
dc.identifier.urihttps://hdl.handle.net/11129/14951
dc.identifier.volume20
dc.identifier.wosWOS:000172574800011
dc.identifier.wosqualityQ2
dc.indekslendigikaynakWeb of Science
dc.indekslendigikaynakScopus
dc.language.isoen
dc.publisherIEEE-Inst Electrical Electronics Engineers Inc
dc.relation.ispartofIeee Transactions on Computer-Aided Design of Integrated Circuits and Systems
dc.relation.publicationcategoryMakale - Uluslararası Hakemli Dergi - Kurum Öğretim Elemanı
dc.rightsinfo:eu-repo/semantics/closedAccess
dc.snmzKA_WoS_20260204
dc.subjectVLSI interconnect
dc.subjectweak and strong coupling
dc.titleA comparison of strong and weak distributed transverse coupling between VLSI interconnects
dc.typeArticle

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